Manufacturing

A best-seller mass flow meter for high temperature environments

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

• High efficiency measurement
• Measuring angles 20° and 60°
• Flexible use with its remote probe
• Range 0-100
• Cost Effective

 

 

• For ultra high gloss measurement
• Dual range gloss meter
• Flexible use with its remote probe
• Measuring angle 60°
• Dual range 0-100 and 0-1000

 

The iHR320 provides a platform for spectroscopic measurements for years to come.

The iHR550 spectrometer offers a unique combination of spectral quality, flexibility, robustness, and ease of use that makes it the ideal general-purpose spectrometer for performing spectral measurements with quality results.

Ideal for ozone fluid density control in semiconductor production processes

The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.

The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.