Application
Semiconductor & FPD
Manufacturing Process Control
High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.
The compact vaporization system does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
The exhaust pressure controller maintains pressure within a chamber at any desired level. Equipped the high-resolution stepper motor and butterfly valve.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
The IR-150 is designed for real time inline concentration measurement using a Non-dispersive infrared (NDIR) method
The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.
The HORIBA Scientific GD-Profiler HR™ gives the optimum in terms of resolution and number of elements to solve analytical problems even in the most complex matrices.
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.