Others

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

An economical gloss meter which utilizes a separate detector and light source, offers the ability to switch between 60 degree measuring angle for standard gloss measurement, and 20 degree measuring angle for high-gloss surfaces...

 

• For ultra high gloss measurement
• Dual range gloss meter
• Flexible use with its remote probe
• Measuring angle 60°
• Dual range 0-100 and 0-1000

 

The HP-480 industrial pH meter is a standard type pH meter that mainly includes frequently used functions.

The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.

The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices