Industry
Printing
The APHA-370 continuously monitors atmospheric THC, NMHC, and CH4 concentrations...
The APMA-370 is a device for continuously monitoring CO concentrations using a coss-modulation NDIR...
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
An economical gloss meter which utilizes a separate detector and light source, offers the ability to switch between 60 degree measuring angle for standard gloss measurement, and 20 degree measuring angle for high-gloss surfaces...
- For ultra high gloss measurement
- Dual range gloss meter
- Flexible use with its remote probe
- Measuring angle 60°
- Dual range 0-100 and 0-1000