Industry
Dry
High precision flow rate measurement with one-touch operation.
Low cost solenoid valve mfc's are suitable for flow control from 0.2sccm to 500slm N2 equivalent.
Endpoint controller for plasma etch cluster tools: Simultaneous Real Time Multi-Chamber - Multi diagnosis monitor
The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.
