Nasschemie

Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm

The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.

Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

Kompaktes, stabiles Spektrometer für sehr hohen Durchsatz, geeignet für Raman-Analysen bei Applikationen, die ein tragbares Gerät erfordern. Für Anwendungen im industriellen Umfeld ist ein Gehäuse verfügbar, dass das Gerät vor schädlichen Einflüssen schützt.

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

Ideal for ozone fluid density control in semiconductor production processes