High Gloss Meter IG-410

     

  • Pour mesure de surfaces hautement réfléchissantes (métaux polis)
  • Possibilité de choisir entre deux échelles de mesure
  • Flexibilité des mesures grâce au capteur mobile
  • Angle de mesure à 60°
  • Deux échelles de mesure au choix : 0-100 et 0-1000
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LA 930

The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.

LB550

Le granulomètre LB-550 utilise la technique de diffusion dynamique de la lumière et permet de mesurer des solutions concentrées, jusqu’à 40% en poids, sur une large gamme de 1nm à 6 microns.

Standard Clean 1 (SC-1) chemical concentration monitor image

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

Appearance of CS-152, SC-2 monitor

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices

SPM Monitor image

High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices

CS Series Monitors

High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices

UVISEL In-Line Spectroscopic Ellipsometer

Ellipsomètre spectroscopique en ligne pour les systèmes roll to roll

XGT-7200

Single point analysis and automated hyperspectral imaging.

Dual vacuum modes.

Spot sizes from 1.2 mm to 10 µm.