Semiconductors

The following analytical and instrumental techniques are used in Semiconductors, please click on the squares for further information.


Alloy Composition, Bandgap	■			■				■
Bandgap, PLE / PL		■
Compound Alloys	■							■
Contamination				■			■	■
Crystallinity (Silicon)	■					■
Doping Effects						■	■	■
Ferroelectric Thin Films	■
Fluorescence Spectra of CdSe Nanoparticles		■
Hetero-Structures							■
High, Low k Materials	■					■		■
Analysis of Multilayer Structures on Silicon			■			■		■
ONO Film	■
Optical Properties	■
Oxidized Porous Silicon	■
Photoluminescence							■
Plasma Etch End Point	■					■
Process Chemicals e.g. Pure Water, H₂SO₄, H₃PO₄, HCl, HNO₃, NH₃, Photo-resist				■		■
Porous Silicon	■
Quality Control Materials for Wafer Manufacturing					■
Quantitative Analysis of BPSG on Silicon			■			■
Raw Materials for Trace Elements				■
SOI Film	■							■
Stress / Strain						■	■
Super Lattice Structure and Defect Investigations	■						■
Superconductor	■						■
Thickness (Monolayer, Multi-Layers, Native Oxide, Roughness, Interface)	■					■
Thin Film Transistors, MOSFET, OTFT	■					■
Uniformity over Film Area and Depth	■
Fast elemental depth profiling								■
Contacts (silicides)								■