Thin Film Control/Analysis
Quickly evaluate and analyze various film characteristics, including thickness, composition, and degree of crystallization, to improve cell quality management and yield.
HORIBA’s products support the formation of ideal films for solar cells, by measuring the thickness and degree of crystallization in each film layer, and selecting the optimum deposition conditions. This enables effective cell quality management, and promotes more stable conversion efficiency.
High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.
Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.Interference occurs when monochromatic light hits the sample surface, resulting in...
Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.
Produits : UVISEL VIS : 210-880 nm | UVISEL FUV : 190-880 nm | UVISEL NIR : 245-2100 nm | UVISEL ER : 190-2100 nm |
Idéal pour la caractérisation des couches minces en recherche et développement.
Visualisez vos échantillons et mesurez vos épaisseurs et constantes optiques en quelques clics!
« Avec l’Auto SE, la simplicité des analyses comme vous ne l’aviez jamais imaginée ! »
Le GD-Profiler 2™ permet l’analyse simultanée de tous les éléments y compris les gaz (azote, oxygène, chlore, hydrogène). Il est l’outil idéal pour la caractérisation des surfaces, des couches minces, des dépôts et le suivi de productions.