
Application
Thin Film Control & Analysis
Featured Products
Displaying results 31 to 40 out of 40
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Endpoint controller for plasma etch cluster tools: Simultaneous Real Time Multi-Chamber - Multi diagnosis monitor
The fast response piezo actuator valves are equipped with metal diaphragms and metal O-rings.
Low cost solenoid valve mfc's are suitable for flow control from 0.2sccm to 500slm N2 equivalent.
TMAH/H2O2 Monitor, CS-139E - High-speed response and compact chemical solution concentration monitor
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
HORIBA Scientific’s triple grating Raman spectrometers offer the ultimate in spectroscopic performance, and are ideally suited for fundamental research and advanced application of chemical analysis using Raman spectroscopy.
In-Line Spectroscopic Ellipsometer for Web Coater and Roll to Roll Systems
High stability and accuracy pressure controller for back side wafer cooling in semiconductor manufacturing, installed piezo actuator valve and pressure sensor.
XelPleX is the ideal solution for label-free and multiplexed molecular interaction analysis.
Single point analysis and automated hyperspectral imaging.
Dual vacuum modes.
Spot sizes from 1.2 mm to 10 µm.
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