Others

24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes

High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.

24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes

Ideal for hydrofluoric acid monitoring in semiconductor manufacturing

• High efficiency measurement
• Measuring angles 20° and 60°
• Flexible use with its remote probe
• Range 0-100
• Cost Effective

 

 

• For ultra high gloss measurement
• Dual range gloss meter
• Flexible use with its remote probe
• Measuring angle 60°
• Dual range 0-100 and 0-1000

 

The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.

The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.

High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices